On the bridge type Josephson junctions fabricated by rf sputter etching.

Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions

The dependence of the ramp geometry on highor low-angle ion-beam etching, used to structure ramp-type Josephson junctions based on ReBa2Cu3O7−δ high-Tc superconductors, is investigated by cross-section transmission electron microscopy. The surface quality, interfaces and crystal defects are analysed by high-resolution electron microscopy. Technical difficulties to reproducibly obtain the desire...

Hysteresis in rf-driven large-area Josephson junctions.

Chaos in long Josephson junctions without external rf driving force.

Simulations of long Josephson junctions in an external magnetic field show a variety of chaotic behaviors. They consist of period-doubling bifurcation, intermittency between and within Fiske steps, and quasiperiodic motion at Fiske steps. A physical explanation for the chaotic behavior is presented. The influence of surface resistance to the chaotic motion is investigated. A diagram in terms of...

Fluxon interaction with external rf radiation in Josephson junctions.

Sputter-Etching of Heterogeneous Surfaces

In conventional sputter etching, heterogeneous surfaces are eroded at generally unpredictable rates. The reasons for this are discussed and a solution to the problem is given: Based on control of redeposition, the technique involves the use of a device called a “catcher,” which is placed near the target of the sputtering chamber to trap re-emitted particles. Experiments are described which conf...